Перегляд за автором "Gapon, A.V."

Сортувати за: Порядок: Результатів:

  • 2D fluid model for interactive development of ICP technological tools 
    Gapon, A.V.; Dahov, A.N.; Dudin, S.V.; Zykov, A.V.; Azarenkov, N.A. (Вопросы атомной науки и техники, 2006)
    The software for ICP device simulation is worked out. Discharge chamber geometry, RF power, pressure and working gas type are the input data. The results of calculation are inductor voltage, ion current density distribution ...
  • Large-area surface wave plasma source 
    Azarenkov, N.A.; Bizyukov, A.A.; Sereda, K.N.; Tseluyko, A.Ph.; Yunakov, N.N.; Gapon, A.V.; Kashaba, A.Y. (Вопросы атомной науки и техники, 2002)
    A surface wave plasma source for the production of a large-diameter, high electron density and low electron temperature plasma at low pressure without using a magnetic field for plasma processing and thin film preparation ...
  • Plasma expansion into gas 
    Azarenkov, N.A.; Gapon, A.V. (Вопросы атомной науки и техники, 2017)
    An initial problem of the low-temperature plasma expansion in an unbounded gaseous medium is considered. It is assumed that the plasma had been created locally in the background gas by a source of ionization which acts ...
  • Potential part of electric field of ICP coil 
    Azarenkov, N.A.; Gapon, A.V. (Вопросы атомной науки и техники, 2021)
    ICP devices are widespread in modern technology, so the capacitive coupling in ICP is well known. It does not make a sufficient impact to the power deposition in plasma, and mostly it assumed to be a harmful effect [1]. ...
  • Surface wave plasma source for broad-beam ion and electron production 
    Azarenkov, N.A.; Bizyukov, A.A.; Gapon, A.V.; Olefir, V.P.; Kashaba, A.Y.; Sereda, K.N.; Tarasov, I.K. (Вопросы атомной науки и техники, 2004)
    The new type of multipurpose plasma source based on the surface wave sustained discharge is presented. The plasma in the source is generated by the RF surface wave discharge excited by the antenna system placed inside ...
  • Transport processes in the low pressure gas discharge plasma 
    Azarenkov, N.A.; Bizjukov, A.A.; Gapon, A.V. (Вопросы атомной науки и техники, 2003)
    Plasma technologies for the film deposition and etching based on the ion flows application are intensively elaborated and used now. Some of the most important requirements imposed on the ion flows are homogeneity and ...
  • Two-stream nonlinear langmuir oscillations 
    Azarenkov, N.A.; Gapon, A.V. (Problems of Atomic Science and Technology, 2023)
    Langmuir oscillations of a large amplitude in a cold collisionless plasma are considered in this work. We passed to the conclusion that multiple streams is an inevitable feature of the Langmuir oscillations in the cold ...